Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
Trickling down through gaps in soil and rock, water flows through sandstone, limestone, and basalt, picking up a microscopic compound called silicon dioxide.
To start, a layer of insulating silicon dioxide is deposited on top of the wafer and then a layer of light sensitive photoresist is spread across the top.
It's made from the stuff of microchips: silicon, a layer of silicon dioxide, and on top a very thin film of silicon nitride, which is perforated by a grid of microscopic circular holes.
With the mask layer built, the wafer goes to an etching tool, where a plasma etcher removes a vertical column through the exposed silicon dioxide until it reaches the previous layer's metal vias.